Фоторезист позитивный ELECTROLUBE, PRP200
Photoresist is very easy to use. Taped originals or film are used for positive photoresist.
The copper-clad board is cleaned and degreased with, for example, acetone, after which a thin layer of photoresist is applied. Then the board is dried at 50 °C in an oven for about 20 min. Thereafter the board is exposed to a UV lamp for about 3–4 min and developed in a solution consisting of 12 g NaOH (sodium hydroxide) and 1 liter of water for subsequent etching.
Positive photoresist in spray can
Фоторезист позитивный ELECTROLUBE, PRP200
Positive, quick drying photoresist with very high solubility characteristics for developing circuit designs on copper laminate.
NOTE: Before application of the photoresist, the board should be heated to 70 °C for 10 min, and then allowed to return to room temperature.
Coverage: 2-2.5 m2 (200 ml)
Drying time
25 °C: 12 h
50 °C: 20 min
Remover: Concentrated developer
Colour: Light green
Propellant: Dimethyl ether
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